CRYSTALLOGRAPHY OF COOPER OXIDE COATINGS DEPOSITED ON Si SUBSTRATE BY REACTIVE MAGNETRON SPUTTERING
Hits: 50
- TITLE: CRYSTALLOGRAPHY OF COOPER OXIDE COATINGS DEPOSITED ON Si SUBSTRATE BY REACTIVE MAGNETRON SPUTTERING
- ABSTRACT: Copper oxide (CuO) is used in the photovoltaic (PV) industry and modern biomedicine. These coatings are applied to increase the wear and corrosion resistance, and to improve the biocompatibility of the materials. In this work, copper oxide coatings were deposited on silicon substrates by reactive magnetron sputtering. During the process, the substrate temperature was in the range from 100 °C to 400 °C and the deposition time was 60 minutes. The crystallographic structure of the obtained samples was characterized by X-ray diffraction. The experiments were performed in a symmetrical Bragg-Brentano geometry using Cu Kα radiation. The patterns were registered in the range from 30° to 80° at 2θ scale. The crystallographic structure of the deposited CuO coatings is discussed with respect to the applied technological conditions. The results obtained in the present study are expected to add knowledge about the processes occurring during reactive magnetron sputtering under different technological conditions, as well as their influence on structure formation in CuO films.
- PAGES: 81-
- DOWNLOAD: CRYSTALLOGRAPHY OF COOPER OXIDE COATINGS DEPOSITED ON Si SUBSTRATE BY REACTIVE MAGNETRON SPUTTERING