VOLUME 66 (6/2023)
| TITLE | | INVESTIGATION OF CATIONIC SURFACTANTS ADSORPTION BEHAVIOUR ON SILICON WAFERS USING IMAGING ELLIPSOMETRY |
| | AUTHOR(S) | | M. Georgiev, B. Konstantinov, K. Marinova, J. Petkov, K. Danov |
| | ABSTRACT | | The research paper explores the adsorption properties of cationic surfactants on silicon wafers through imaging ellipsometry. The objective of this research is to shed light on the layer structures formed by cationic surfactants, specifically those based on dimethyl ammonium chloride, on silicon wafers. The study involved the deposition of three distinct cationic surfactants on the wafer's surface, followed by the measurement of the adsorption layers formed. The findings reveal the creation of thin, smooth, and irregular adsorption layers. Interestingly, no correlation was found between the thickness of the adsorption layer and the surfactant tail's chain length. The research underlines the significant role which the imaging ellipsometry can have for studying surfactants' adsorption properties on surfaces, contributing to their optimal usage in various fields. |
| | DOI | | doi.org/10.62853/WVFB5121 |
| | PAGES | | 38-42 |
| | DOWNLOAD | | INVESTIGATION OF CATIONIC SURFACTANTS ADSORPTION BEHAVIOUR ON SILICON WAFERS USING IMAGING ELLIPSOMETRY |
| | How to cite this article: | | Georgiev M., Konstantinov B., Marinova K., Petkov J., Danov K. Investigation of cationic surfactants adsorption behavior on silicon wafers using imaging ellipsometry. Journal of the Technical University of Gabrovo 66 (2023) 38-42 |
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